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- Author: Terence K S Wong
- Publisher: Bentham Science Publishers
- ISBN-10: 160805554X
- ISBN-13: 9781608055548
- Format: 21.6 x 27.9 x 0.9 cm, minkšti viršeliai
- Language: English
- SAVE -10% with code: EXTRA
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Description
This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this book specifically discusses strain metrology as applied to semiconductor devices with both depth and focus.
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- Author: Terence K S Wong
- Publisher: Bentham Science Publishers
- ISBN-10: 160805554X
- ISBN-13: 9781608055548
- Format: 21.6 x 27.9 x 0.9 cm, minkšti viršeliai
- Language: English English
This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this book specifically discusses strain metrology as applied to semiconductor devices with both depth and focus.
Reviews