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- Author: Kenneth A Jackson
- Publisher: Wiley-Vch
- Year: 2010
- Pages: 433
- ISBN-10: 3527327363
- ISBN-13: 9783527327362
- Format: 17.5 x 24.4 x 2.5 cm, kieti viršeliai
- Language: English
- SAVE -10% with code: EXTRA
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Description
Kinetic ProcessesThis revised edition provides the reader with an up-to-date account of the current state of crystal growth kinetics. Amidst the new content is - published for the first time in a book - the groundbreaking results of spinodal decomposition.
The refined didactical approach with a streamlined presentation now allows readers to grasp the kinetic concepts even more easily, coherently introducing the field of kinetic processes, especially those involved in crystal growth, and explaining such phenomena as diffusion, nucleation, segregation and phase transitions at a level accessible to graduate students. In addition to the basic kinetic concepts, the textbook presents modern applications where these processes play a major role, including ion implantation, plasma deposition and rapid thermal processing.
EXTRA 10 % discount with code: EXTRA
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- Author: Kenneth A Jackson
- Publisher: Wiley-Vch
- Year: 2010
- Pages: 433
- ISBN-10: 3527327363
- ISBN-13: 9783527327362
- Format: 17.5 x 24.4 x 2.5 cm, kieti viršeliai
- Language: English English
This revised edition provides the reader with an up-to-date account of the current state of crystal growth kinetics. Amidst the new content is - published for the first time in a book - the groundbreaking results of spinodal decomposition.
The refined didactical approach with a streamlined presentation now allows readers to grasp the kinetic concepts even more easily, coherently introducing the field of kinetic processes, especially those involved in crystal growth, and explaining such phenomena as diffusion, nucleation, segregation and phase transitions at a level accessible to graduate students. In addition to the basic kinetic concepts, the textbook presents modern applications where these processes play a major role, including ion implantation, plasma deposition and rapid thermal processing.
Reviews