618,11 €
686,79 €
-10% with code: EXTRA
High Pressure Rheology for Quantitative Elastohydrodynamics
High Pressure Rheology for Quantitative Elastohydrodynamics
618,11
686,79 €
  • We will send in 10–14 business days.
High-Pressure Rheology for Quantitative Elastohydrodynamics, Second Edition, contains updated sections on scaling laws and thermal effects, including new sections on the importance of the pressure dependence of viscosity, the role of the localization limit of stress, and new material on the shear dependence of viscosity and temperature dependence viscosity. Since publication of the original edition, the experimental methods, the resulting property data and new correlations have resulted in a r…
  • Publisher:
  • ISBN-10: 0444641564
  • ISBN-13: 9780444641564
  • Format: 15.2 x 22.9 x 2 cm, softcover
  • Language: English
  • SAVE -10% with code: EXTRA

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High-Pressure Rheology for Quantitative Elastohydrodynamics, Second Edition, contains updated sections on scaling laws and thermal effects, including new sections on the importance of the pressure dependence of viscosity, the role of the localization limit of stress, and new material on the shear dependence of viscosity and temperature dependence viscosity. Since publication of the original edition, the experimental methods, the resulting property data and new correlations have resulted in a revolution in understanding of the mechanisms of film formation and the mechanical dissipation.

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  • Author: Scott S Bair
  • Publisher:
  • ISBN-10: 0444641564
  • ISBN-13: 9780444641564
  • Format: 15.2 x 22.9 x 2 cm, softcover
  • Language: English English

High-Pressure Rheology for Quantitative Elastohydrodynamics, Second Edition, contains updated sections on scaling laws and thermal effects, including new sections on the importance of the pressure dependence of viscosity, the role of the localization limit of stress, and new material on the shear dependence of viscosity and temperature dependence viscosity. Since publication of the original edition, the experimental methods, the resulting property data and new correlations have resulted in a revolution in understanding of the mechanisms of film formation and the mechanical dissipation.

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