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- Author: Cameron
- Publisher: John Wiley & Sons
- ISBN-10: 1118062779
- ISBN-13: 9781118062777
- Format: 15.5 x 23.6 x 2.3 cm, hardcover
- Language: English
- SAVE -10% with code: EXTRA
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Description
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
EXTRA 10 % discount with code: EXTRA
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- Author: Cameron
- Publisher: John Wiley & Sons
- ISBN-10: 1118062779
- ISBN-13: 9781118062777
- Format: 15.5 x 23.6 x 2.3 cm, hardcover
- Language: English English
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Reviews